Applied Materials had 15 patents in big data during Q2 2024. Applied Materials Inc has developed innovative methods for fabricating 3D NAND flash memory structures with hollow epitaxial channels and direct wordline contact formation. These approaches involve forming alternating material layers, etching channel holes, and growing hollow epitaxial silicon cores, as well as creating contact openings at different depths and utilizing sacrificial gapfill layers for improved device performance. GlobalData’s report on Applied Materials gives a 360-degree view of the company including its patenting strategy. Buy the report here.
Applied Materials had no grants in big data as a theme in Q2 2024.
Recent Patents
Application: 3d memory including hollow epitaxial channels (Patent ID: US20240188300A1)
The patent filed by Applied Materials Inc. discloses a method for fabricating 3D NAND flash memory structures with hollow epitaxial channels. The method involves forming alternating material layers on a substrate, etching a channel hole through these layers, and growing a hollow epitaxial silicon core through the channel hole. This structure includes a tunneling layer, a channel liner, and a core gap material, allowing for efficient memory storage.
The patent also includes claims for a 3D NAND memory structure with a silicon substrate, alternating material layers, and a hollow epitaxial silicon core. The structure is designed to optimize memory storage and connectivity, with additional features such as a support structure and a layer of epitaxial silicon connecting multiple channels. The method outlined in the patent involves precise steps such as etching channel holes, forming tunneling layers, and epitaxially growing the hollow core, ensuring the efficient fabrication of 3D NAND memory structures with improved performance and reliability.
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