Hitachi had five patents in advanced materials during Q1 2024. Hitachi Ltd filed a patent for a defect inspection device that calculates height variation and deviation amount of focusing position to control the focus actuator. Another patent was filed for a method to visualize end devices by setting object display limits based on priority status and displaying objects accordingly on a display map. GlobalData’s report on Hitachi gives a 360-degree view of the company including its patenting strategy. Buy the report here.

Hitachi grant share with advanced materials as a theme is 20% in Q1 2024. Grant share is based on the ratio of number of grants to total number of patents.

Recent Patents

Application: Defect inspection device (Patent ID: US20240096667A1)

The patent filed by Hitachi Ltd. describes a defect inspection device that utilizes an inclined optical axis and imaging sensor to calculate and control the focusing position of an illumination spot on a sample surface. The device includes components such as a sample stage, illumination and detection optical systems, imaging sensor, height measuring unit, focus actuator, position sensor, and a computer for control. By calculating height variation and deviation amounts, the focus actuator is controlled to align the focusing position with the imaging sensor's light receiving surface. Additionally, scattered light intensities at the same coordinates of the sample are added for accurate defect inspection.

The device's claims detail various configurations and functionalities, such as the use of s-polarized light, specific angle ranges for the optical axis inclination, imaging magnification requirements, and the incorporation of a piezoelectric actuator for the focus actuator. The device also allows for correction of optical image deviations, translation of the imaging sensor, and control of multiple actuators based on response speeds. Furthermore, specific mathematical representations are provided for setting the direction of translation for the imaging sensor based on various parameters. Overall, the patent outlines a comprehensive defect inspection device that employs innovative optical and computational techniques to enhance inspection accuracy and efficiency.

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