Screen has been granted a patent for a substrate treating apparatus and method. The apparatus includes a transport mechanism and a reversing mechanism to handle substrates without direct contact. The innovative design allows for efficient substrate treatment and handling. GlobalData’s report on Screen gives a 360-degree view of the company including its patenting strategy. Buy the report here.

According to GlobalData’s company profile on Screen, Semiconductor fabrication robots was a key innovation area identified from patents. Screen's grant share as of March 2024 was 52%. Grant share is based on the ratio of number of grants to total number of patents.

Substrate treating apparatus with reversing mechanism for horizontal posture

Source: United States Patent and Trademark Office (USPTO). Credit: Screen Holdings Co Ltd

The granted patent (Publication Number: US11967518B2) discloses a substrate treating apparatus comprising a supporting portion, a transport mechanism, and a reversing mechanism. The transport mechanism includes a first suction portion and a transport driving unit, while the reversing mechanism includes a second hand with a second suction portion and a hand driving unit with a rotation driving unit. The apparatus is designed to transport, reverse, and deliver substrates in a horizontal posture without direct contact, utilizing gas flow along the top face of the substrate. The rotation driving unit allows the second suction portion to move between positions where gas is blown downward and upward, ensuring efficient substrate handling.

Furthermore, the apparatus includes features such as a position adjusting unit in the supporting portion to adjust the substrate's position horizontally, a movement driving unit in the reversing mechanism to prevent interference with the transport mechanism, and a unique configuration of branches connected to the movement driving unit for precise substrate manipulation. The rotation axis, location of the second suction portion, and its movements are carefully designed to optimize the substrate treating process. Overall, the patent details a sophisticated substrate treating apparatus with advanced mechanisms for efficient and precise handling of substrates in a horizontal posture, showcasing innovative solutions for substrate processing in various industrial applications.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.