Tokyo Electron had 61 patents in future of work during Q4 2023. The patents filed by Tokyo Electron Ltd in Q4 2023 focus on improving substrate processing efficiency and accuracy. This includes analyzing time-series data from processing apparatuses, controlling temperature in processing containers, adjusting processing times for substrates, collecting and comparing data from different processing spaces, and efficiently managing models applied to substrate manufacturing processes. These innovations aim to enhance process control and optimization in semiconductor manufacturing. GlobalData’s report on Tokyo Electron gives a 360-degreee view of the company including its patenting strategy. Buy the report here.

Tokyo Electron grant share with future of work as a theme is 49% in Q4 2023. Grant share is based on the ratio of number of grants to total number of patents.

Recent Patents

Application: Information processing apparatus, storage medium, and analysis method (Patent ID: US20230418268A1)

The patent filed by Tokyo Electron Ltd. describes an information processing apparatus that acquires time-series data from substrate processing apparatuses, analyzes the similarity between the data using dynamic time warping to digitize the differences, and outputs the analysis results. The apparatus aims to identify differences in data output from processing apparatuses following the same sequence, potentially indicating variations in performance or maintenance needs.

The claims associated with the patent detail the specific configurations and functionalities of the information processing apparatus, including the acquisition of sensor data, analysis of data before and after maintenance, and the output of identification information for data with significant differences. Additionally, the patent covers a computer-readable storage medium with a program for executing the process, as well as an analysis method involving acquiring data from substrate processing systems, analyzing the data for differences, and outputting the analysis results. Overall, the patent focuses on utilizing dynamic time warping to compare time-series data from substrate processing apparatuses to improve process monitoring and maintenance.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.