Tokyo Electron had 65 patents in future of work during Q2 2024. Tokyo Electron Ltd filed patents for vacuum processing apparatus with a tilt changer, a substrate processing system with a conversion table for resistance values, a test device with temperature sensors for controlling stage temperature, and a substrate transfer unit with feedback control and image processing for accurate substrate transfer. GlobalData’s report on Tokyo Electron gives a 360-degree view of the company including its patenting strategy. Buy the report here.
Tokyo Electron had no grants in future of work as a theme in Q2 2024.
Recent Patents
Application: Plasma processing apparatus, plasma state detection method, and plasma state detection program (Patent ID: US20240186125A1)
The patent filed by Tokyo Electron Ltd. describes a plasma processing apparatus that includes a heater controlled by a heater controller to maintain a constant temperature on a mounting surface for a workpiece. The apparatus measures power supplied to the heater in both unignited and transient states, calculates heat input from the plasma, and outputs information based on the calculated heat input amount. Additionally, the apparatus can control power for individual heaters in different regions of the mounting surface to ensure uniform temperature distribution and adjust plasma processing parameters based on plasma density distribution.
Furthermore, the patent also covers a plasma state detection method and program that involve controlling power to the heater, measuring power in unignited and transient states, fitting a calculation model to calculate power in the transient state, determining heat input from the plasma, and outputting information based on the calculated heat input amount. These methods and programs enable efficient monitoring and control of plasma processing conditions to ensure optimal performance and quality of the processed workpieces.
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