Tokyo Electron grant share with robotics as a theme is 30% in Q4 2023. Grant share is based on the ratio of number of grants to total number of patents.

Recent Patents

Application: Substrate processing apparatus and transfer method (Patent ID: US20230420286A1)

The patent filed by Tokyo Electron Ltd. describes a substrate processing apparatus that includes a first and second placement chamber, a transfer robot, and a controller. The controller is configured to detect the position of an object on the transfer robot when unloading it from the first chamber, transfer it to a standby position in the first chamber, then to a standby position in the second chamber, and detect its position when loading it into the second chamber. The transfer speed is controlled based on these positions, allowing for efficient and accurate transfer of objects between chambers.

Additionally, the patent includes claims related to position detection sensors, controlling transfer speed based on position differences, feedback mechanisms for transfer speed adjustments, and the types of chambers and objects involved in the substrate processing apparatus. The apparatus can handle substrates or consumable parts like focus rings, cover rings, and upper electrodes. The method outlined in the patent ensures precise and controlled transfer of objects between chambers, enhancing the overall efficiency and reliability of substrate processing operations.

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