Sino-American Silicon Products. has been granted a patent for a liner assembly in a chemical vapor deposition system. The assembly features two liners with curved fluid guides that create a rounded channel for efficient substrate processing within the system’s processing chamber. GlobalData’s report on Sino-American Silicon Products gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Sino-American Silicon Products, Artificial photosynthesis was a key innovation area identified from patents. Sino-American Silicon Products's grant share as of July 2024 was 50%. Grant share is based on the ratio of number of grants to total number of patents.
Liner assembly for chemical vapor deposition substrate processing system
The granted patent US12071686B2 describes a chemical vapor deposition (CVD) system designed for substrate processing. The system features a processing chamber that includes both a lower and an upper chamber wall, enclosing a defined processing volume. Central to the system are two liners: a first liner positioned between the lower chamber wall and the processing volume, and a second liner situated between the upper chamber wall and the processing volume. Each liner incorporates a fluid guide with distinct portions that create a rounded fluid guiding channel. The first fluid guide consists of a first portion with a specific radius and a second portion, while the second fluid guide mirrors this structure with its own corresponding portions. The design emphasizes continuously rounded surfaces to facilitate fluid movement within the chamber.
Further claims detail the specific shapes and configurations of the fluid guides, including concave and convex portions, which enhance the system's efficiency. The radii of these portions are specified to be between 10 mm and 20 mm. Additionally, the patent outlines the inclusion of partition walls extending from the second fluid guide, which are designed to have lower surfaces that complement the shape of the first fluid guide. This innovative design aims to optimize the fluid dynamics within the CVD system, potentially improving the uniformity and quality of the substrate processing. The patent thus presents a comprehensive approach to enhancing chemical vapor deposition technology through its unique liner and fluid guide configurations.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
