Taiwan Semiconductor Manufacturing had three patents in digitalization during Q1 2024. The patents filed by Taiwan Semiconductor Manufacturing Co Ltd in Q1 2024 focus on improving edge exposure tools by automatically adjusting lens parameters and utilizing advanced techniques like big data mining and machine learning. Additionally, a method for manufacturing lithographic masks involves optical proximity correction and inverse lithographic technology processes to enhance mask layouts for integrated circuits. GlobalData’s report on Taiwan Semiconductor Manufacturing gives a 360-degree view of the company including its patenting strategy. Buy the report here.

Taiwan Semiconductor Manufacturing grant share with digitalization as a theme is 33% in Q1 2024. Grant share is based on the ratio of number of grants to total number of patents.

Recent Patents

Application: Lens adjustment for an edge exposure tool (Patent ID: US20240085798A1)

The patent filed by Taiwan Semiconductor Manufacturing Co Ltd describes an edge exposure tool with a lens adjustment device that automatically adjusts parameters of the edge exposure lens to maintain performance and prevent drifting out of tolerance. The tool includes a controller that determines adjustment and exposure control parameters using techniques like big data mining and machine learning. This innovation aims to reduce downtime caused by cleaning and calibration of the lens, ultimately enhancing the operation performance of the edge exposure tool and minimizing the risk of wafer scratching.

The claims associated with the patent detail the components and functions of the edge exposure tool, such as the lens adjustment device with support arms and adjustment motors, and the controller that signals adjustments to the lens. The method outlined in the claims involves adjusting the edge exposure lens based on various parameters, including horizontal position and distance from the wafer surface. By utilizing the lens adjustment device to direct radiation towards the wafer edge, the tool ensures precise exposure while minimizing potential issues. Overall, the patent focuses on enhancing the efficiency and accuracy of edge exposure processes in semiconductor manufacturing through automated adjustments and advanced control mechanisms.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.