Advanced Micro-Fabrication Equipment has been granted a patent for a radio frequency electrode assembly for a plasma processing apparatus. The assembly includes features like a base with fluid passages, an electrostatic chuck, a focus ring, and a heat conducting ring to adjust polymers distribution in the edge area of the substrate. GlobalData’s report on Advanced Micro-Fabrication Equipment gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Advanced Micro-Fabrication Equipment, 3D memory devices was a key innovation area identified from patents. Advanced Micro-Fabrication Equipment's grant share as of February 2024 was 52%. Grant share is based on the ratio of number of grants to total number of patents.
Patent granted for radio frequency electrode assembly for plasma processing
A recently granted patent (Publication Number: US11875970B2) discloses a radio frequency electrode assembly designed for a plasma processing apparatus. The assembly includes a base with a first fluid passage, an electrostatic chuck for substrate support, a focus ring, and a heat conducting ring with a second fluid passage for efficient heat conduction. The unique design allows for varying distances from the top of the second fluid passage to the bottom of the focus ring along the perimeter, enhancing thermal management during plasma processing.
Furthermore, the patent details additional features such as a gap between the heat conducting ring and the base, a thermal insulation material layer, a coupling ring, a grounding ring, and a dielectric ring. These components work together to optimize the performance of the radio frequency electrode assembly. The patent also extends to a plasma processing apparatus incorporating the described electrode assembly, complete with a vacuum chamber, gas intake means, and a flat bottom plate for enhanced functionality and efficiency in plasma processing applications. The innovative design and configuration of the electrode assembly and the plasma processing apparatus aim to improve thermal management, substrate support, and overall performance in plasma processing operations.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
