Applied Materials has patented a method for depositing a metal oxo photoresist using dry deposition processes. The method involves forming multiple metal oxo films on a substrate with varying flow rates of metal precursor and oxidant vapors. GlobalData’s report on Applied Materials gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Applied Materials, 3D memory devices was a key innovation area identified from patents. Applied Materials's grant share as of January 2024 was 42%. Grant share is based on the ratio of number of grants to total number of patents.
Method of depositing metal oxo photoresist using dry deposition
A recently granted patent (Publication Number: US11886120B2) discloses a method for forming a photoresist layer over a substrate using a unique process involving the deposition of metal oxo films. The method involves the formation of a first metal oxo film on the substrate using a vapor phase process with non-uniform flow rates of metal precursor and oxidant vapors. Subsequently, a second metal oxo film is formed over the first film using a similar vapor phase process with different metal precursor and oxidant vapors. The method allows for the creation of a compositional gradient by stacking multiple metal oxo films, each with varying material compositions and adhesion strengths.
Furthermore, the patent describes a method for forming a photoresist layer in a vacuum chamber by introducing a metal precursor vapor with specific chemical properties, followed by oxidant vapors to create the desired metal oxo containing material. The process involves controlling the flow rates of the vapors across the substrate to ensure uniform deposition. Additional steps such as plasma treatment and repeated deposition cycles are included to enhance the quality of the photoresist layer. The method offers versatility in ligand and leaving group selection, allowing for customization based on specific application requirements. Overall, the patented method provides a novel approach to forming photoresist layers with improved adhesion and composition control, making it a valuable innovation in the field of substrate coating technologies.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
