ASML Holding has developed a multi-beam apparatus for high-resolution observation of sample surfaces. The apparatus uses a charged particle source, condenser lens, and source conversion unit to form multiple beamlets for improved imaging. The technology aims to enhance resolution and throughput in semiconductor manufacturing processes. GlobalData’s report on ASML Holding gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on ASML Holding, AI-assisted photolithography was a key innovation area identified from patents. ASML Holding's grant share as of January 2024 was 47%. Grant share is based on the ratio of number of grants to total number of patents.
Multi-beam apparatus for observing sample surface with high resolution
A recently granted patent (Publication Number: US11887807B2) discloses a multi-beam apparatus designed for observing a surface of a sample. The apparatus includes a charged particle source that generates a charged particle beam, a condenser lens to collimate the beam onto a source conversion unit forming multiple beamlets, and electron optics elements to direct the beamlets towards the primary optical axis using different deflection angles. The apparatus also features beam-limit openings to control the currents of the beamlets, allowing for precise observation of the sample surface.
Moreover, the patent details the movability of the condenser lens between various positions, including a first position near the charged particle source, a second position farther away, and several third positions in between. The optical axis of the condenser lens aligns with the primary optical axis of the apparatus, ensuring accurate observation. The condenser lens comprises annular electrodes that facilitate movement between positions by adjusting electrical potential, providing flexibility in the observation process. Additionally, the apparatus includes magnetic lenses that can be controlled to move the condenser lens to different positions, enhancing the versatility and functionality of the multi-beam apparatus for surface observation in scanning charged particle microscopes.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
