Axcelis Technologies has developed an ion implantation system that can implant high charge state ions into a workpiece while minimizing trace metal contamination. By selectively passing desired ions through a charge selector, the system ensures only the desired ions are implanted, enhancing the quality of the final product. GlobalData’s report on Axcelis Technologies gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Axcelis Technologies, 3D memory devices was a key innovation area identified from patents. Axcelis Technologies's grant share as of February 2024 was 59%. Grant share is based on the ratio of number of grants to total number of patents.
Ion implantation system for high charge state ions with minimal contamination
A recently granted patent (Publication Number: US11923169B2) discloses an ion implantation system designed to generate desired ions of a specific species while minimizing the presence of trace metal ions from a contaminant species. The system includes an ion source, extraction apparatus, mass analyzer, accelerator, charge stripping apparatus, and charge selector. By selectively passing only the desired ions at a specific charge state through the charge selector, the final ion beam produced contains minimal trace metal ions, ensuring the purity of the ion beam for implantation processes.
Furthermore, the patent details the configuration of the ion source, extraction apparatus, accelerator, charge stripper, and charge selector within the system. The inclusion of an energy filter and the positioning of the charge stripper downstream of the accelerator contribute to the efficient stripping of electrons from the desired ions, resulting in a final ion beam with significantly reduced trace metal ions. The system's ability to generate a final ion beam with zero trace metal ions enhances the precision and effectiveness of ion implantation processes, making it a valuable innovation in the field of semiconductor manufacturing and other applications requiring ion beam purity.
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