Comet has been granted a patent for a radio frequency plasma processing system. The system includes a reaction chamber, an electrode, and multiple plates with conducting layers connected to ground through variable reactance circuits. The innovative design allows for precise control and optimization of plasma processes. GlobalData’s report on Comet gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Comet, was a key innovation area identified from patents. Comet's grant share as of January 2024 was 38%. Grant share is based on the ratio of number of grants to total number of patents.
Plasma processing system with variable impedance sensors
A recently granted patent (Publication Number: US11887820B2) discloses a radio frequency plasma processing system designed to enhance the efficiency and safety of plasma processes on wafers. The system includes a reaction chamber where radio-frequency power excites a plasma, an electrode powering the plasma, and a set of sensors strategically placed around the electrode. These sensors are connected to variable impedance circuits controlled by an automated controller to maintain a specified shunt impedance between each sensor and electric ground. The automated controller can detect plasma fault conditions based on sensor measurements and trigger response actions such as activating an alarm or adjusting power to prevent improper wafer processing.
Furthermore, the patent details a system for controlling the electromagnetic wave power spectrum on a wafer's surface within a radio frequency plasma processing setup. Similar to the previous system, this setup includes a reaction chamber, an electrode receiving plasma flow, and sensors positioned around the electrode. An automated controller processes sensor data to identify plasma faults and execute response actions like interrupting power or changing radio-frequency settings. By incorporating variable impedance circuits and strategically placed sensors, these systems aim to optimize plasma processes, enhance wafer processing outcomes, and ensure operational safety in radio frequency plasma processing environments.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
