Aixtron has filed a patent for a method to identify faulty or incorrectly placed substrates in a chemical vapor deposition (CVD) reactor. The method involves using optical sensors to measure properties of the substrate surfaces, creating measurement curves and patterns, and comparing them to identify any discrepancies. GlobalData’s report on Aixtron gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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Method for identifying faulty or incorrectly placed substrates in cvd reactor
A recently filed patent (Publication Number: US20230295807A1) describes a method for identifying faulty substrates or substrates with incorrect placement within a chemical vapor deposition (CVD) reactor. The method involves translating a measuring point over the surfaces of the substrates during the treatment process and acquiring optical properties of the surfaces using one or more optical sensors. Based on the acquired optical properties, a measurement curve is determined, and patterns are identified from the curve. A reference pattern is established, and the patterns are compared with the reference pattern to identify any faults.
In one embodiment, the substrates are arranged in a regular arrangement on a susceptor, which is rotated about an axis of rotation. The measuring point translates over the substrates along a circular path as a result of the rotation. The optical properties are acquired during this translation, and measurement values are determined based on the acquired properties. Patterns are then identified from the measurement values, and associated values are determined for each pattern. Faults are identified by comparing the associated values with each other or with a reference value.
The patterns can be determined from reflectance values or measured temperature values, and techniques such as Fourier transformation or noise analysis can be applied to the measurement values to determine the patterns. The reference value can be a characteristic value or mean value determined from the associated values, and a fault is identified if a deviation between one of the values and the reference value exceeds a threshold.
The method can be used to control the CVD reactor or a heating device for the susceptor. Additionally, the patent describes a CVD reactor that includes a reactor housing, a susceptor, a heating device, an optical sensor, and a computing device programmed to perform the method.
Overall, this patent presents a method and system for identifying faulty substrates or substrates with incorrect placement within a CVD reactor using optical properties and pattern analysis. The method offers a potential solution for improving the quality control and efficiency of CVD processes.
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