Kulicke & Soffa Industries has patented a lithographic system with a mask including a heat removal apparatus. The method involves supporting a workpiece, projecting an image using radiation, positioning a reticle, and using a mask with a radiation absorbing coating. GlobalData’s report on Kulicke & Soffa Industries gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Kulicke & Soffa Industries, Under-screen biometric identification was a key innovation area identified from patents. Kulicke & Soffa Industries's grant share as of February 2024 was 49%. Grant share is based on the ratio of number of grants to total number of patents.
Lithographic system with mask for radiation image projection
A recently granted patent (Publication Number: US11921435B2) discloses a method for operating a lithographic system. The method involves supporting a workpiece, projecting an image onto the workpiece using radiation, positioning a reticle, and placing a mask within 100 mm of the reticle along the z-axis of the system. The mask, designed to block radiation, features an inorganic black coating and includes a body portion with a radiation-absorbing coating. The mask defines an illumination area of the projected image using a pattern from the reticle and radiation source, with the option for variability in the illumination area.
Furthermore, the patent details the inclusion of a heat removal apparatus in the mask, directing cooling fluid towards the reticle. The heat removal apparatus comprises cooling channels to receive the cooling fluid from a source, which can be air or a liquid. The cooling fluid is circulated back to the source after providing cooling to the mask. Additionally, the mask includes a plurality of elements that collectively define the illumination area, with some elements being moveable to adjust the size of the illumination area. The mask can also be moved within the x-y plane of the lithographic system to vary the location of the illumination area, offering flexibility in selecting from multiple illumination areas for projecting images onto the workpiece.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
