Screen has been granted a patent for a substrate processing method involving the use of ozone-containing gas and sulfuric acid to remove organic films. The method includes specific steps of gas introduction, spraying, and reaction, enhancing substrate cleaning efficiency. GlobalData’s report on Screen gives a 360-degree view of the company including its patenting strategy. Buy the report here.

According to GlobalData’s company profile on Screen, Semiconductor fabrication robots was a key innovation area identified from patents. Screen's grant share as of February 2024 was 52%. Grant share is based on the ratio of number of grants to total number of patents.

Substrate processing method using ozone and sulfuric acid

Source: United States Patent and Trademark Office (USPTO). Credit: Screen Holdings Co Ltd

A recently granted patent (Publication Number: US11919049B2) discloses a substrate processing method and apparatus for removing an organic film on a substrate. The method involves introducing ozone-containing gas into a substrate processing chamber to fill the space above the substrate, followed by spraying a heated chemical liquid containing sulfuric acid onto the substrate. The chemical liquid is sprayed from an atomization nozzle facing the substrate's upper surface, allowing the ozone to react with the sulfuric acid. The process includes confirming specific pressure and ozone concentration levels in the chamber and collecting and reusing the chemical liquid for efficient processing.

The substrate processing apparatus includes a substrate holder, an ozone supplier, an atomization nozzle for spraying the chemical liquid, a chemical liquid supplier with a heater, and a controller to manage the ozone and chemical liquid supply. The method and apparatus ensure effective removal of the organic film by reacting the chemical liquid with ozone above the substrate. The ozone supplier is strategically positioned higher than the substrate's surface, and the process involves multiple steps of spraying, collecting, and reusing the chemical liquid. The patent emphasizes the importance of the ozone-sulfuric acid reaction in processing the substrate and achieving the desired results efficiently.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.