Taiwan Semiconductor Manufacturing had 40 patents in artificial intelligence during Q1 2024. The patents filed by Taiwan Semiconductor Manufacturing Co Ltd in Q1 2024 include an extreme ultraviolet lithography system with a 3-dimensional diagnostic module, a physical vapor deposition tool with a magnet component for increased throughput, a behavior recognition device for semiconductor manufacturing apparatus, a method for layout generation and timing analysis of integrated circuits, and an edge exposure tool with automatic adjustment capabilities to maintain performance and reduce downtime. GlobalData’s report on Taiwan Semiconductor Manufacturing gives a 360-degree view of the company including its patenting strategy. Buy the report here.

Taiwan Semiconductor Manufacturing grant share with artificial intelligence as a theme is 35% in Q1 2024. Grant share is based on the ratio of number of grants to total number of patents.

Recent Patents

Application: Euv lithography system with 3d sensing and tunning modules (Patent ID: US20240103378A1)

The patent filed by Taiwan Semiconductor Manufacturing Co Ltd describes an extreme ultraviolet (EUV) lithography system that includes a radiation source and an integrated EUV control system. The EUV control system comprises a 3-dimensional diagnostic module (3DDM) for collecting a laser beam profile in 3D mode, an analysis module for analyzing the profile, a database for storing the data, and an EUV control module for adjusting the radiation source based on the analysis. The system aims to enhance EUV radiation by adjusting the laser beam profile through various mechanisms such as laser alignment, targeting position control, and vessel adjustments.

Furthermore, the EUV lithography system includes components like a contamination monitor to track material droplets, photodiodes for laser beam collection, and various monitoring units for plasma and EUV radiation. The system also involves methods like correlation analysis, machine learning, and tool matching to optimize the laser beam profile and enhance EUV radiation. Overall, the patent outlines a comprehensive EUV lithography system with advanced diagnostic and control features to improve the efficiency and accuracy of lithography processes in semiconductor manufacturing.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.