Wrap Technologies has been granted a patent for a system that generates an optical beam array using a laser light source and an array generating optical element. The beam array consists of at least two pattern beams diverging at a non-zero angle, with a void region between them devoid of the primary beam. GlobalData’s report on Wrap Technologies gives a 360-degree view of the company including its patenting strategy. Buy the report here.

According to GlobalData’s company profile on Wrap Technologies, was a key innovation area identified from patents. Wrap Technologies's grant share as of February 2024 was 48%. Grant share is based on the ratio of number of grants to total number of patents.

Patent granted for system generating optical beam array

Source: United States Patent and Trademark Office (USPTO). Credit: Wrap Technologies, Inc.

A recently granted patent (Publication Number: US11852439B2) discloses a system for generating an optical beam array. The system includes a laser light source that generates a primary beam of light and an array generating optical element that splits the primary beam into a beam array. This beam array consists of at least two distinct pattern beams diverging at a non-zero angle from each other, with a void region between them devoid of the primary beam. The angle between the pattern beams ranges from 0.5 to 5 degrees, with a specific embodiment having an angle of 0.75 degrees. The optical element can be a Diffractive Optical Element (DOE) and may include a collimator between the laser light source and the DOE.

Furthermore, the patent describes a projectile launcher device incorporating the optical beam generating system. This device features a body with sockets for projectiles, a power source for expelling the projectiles, and the optical beam generating system. The system generates a beam array with distinct pattern beams diverging at a non-zero angle from each other, with a void region between them. The angle between the pattern beams is specified, and the beams can be arranged on a common pattern plane parallel to the projectile plane. The device may include at least three pattern beams, with a specific embodiment having seven pattern beams. Each pattern beam is devoid of any portion of the primary beam, enhancing the precision and effectiveness of the projectile launcher device.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.