Wrap Technologies has been granted a patent for a system that generates an optical beam array using a laser light source and an array generating optical element. The beam array includes distinct pattern beams with a void region between them, devoid of the primary beam. GlobalData’s report on Wrap Technologies gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Wrap Technologies, was a key innovation area identified from patents. Wrap Technologies's grant share as of January 2024 was 49%. Grant share is based on the ratio of number of grants to total number of patents.
Patent granted for system generating optical beam array
A recently granted patent (Publication Number: US11852439B2) discloses a system for generating an optical beam array. The system comprises a laser light source that generates a primary beam of light and an array generating optical element that splits the primary beam into a beam array. This beam array includes at least two distinct pattern beams diverging at a non-zero angle from each other, with a void region between them devoid of the primary beam. The angle between the pattern beams is specified to be between 0.5 degrees and 5 degrees, with a specific embodiment at 0.75 degrees. The array generating optical element is described as a Diffractive Optical Element (DOE), and the system may include a collimator between the laser light source and the DOE.
Furthermore, the patent also describes a projectile launcher device incorporating the optical beam generating system. This device includes a body with sockets for projectiles, a power source for expelling the projectiles, and the optical beam generating system. The system generates a beam array with distinct pattern beams diverging at a non-zero angle from each other, with a void region between them. The angle between the pattern beams is specified, and the system can include at least three pattern beams or up to seven pattern beams on a common plane. The device is designed for precise optical beam generation in alignment with the projectile plane, enhancing accuracy and efficiency in launching projectiles.
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