Aixtron has been granted a patent for a device that attaches a susceptor to a CVD reactor’s drive shaft, allowing rotation. The device includes a base plate, support plate, adjusting levers, and a flange element. The support plate’s inclination can be adjusted, enhancing efficiency in CVD processes. GlobalData’s report on Aixtron gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Aixtron, 3D memory devices was a key innovation area identified from patents. Aixtron's grant share as of May 2024 was 40%. Grant share is based on the ratio of number of grants to total number of patents.
Device for attaching susceptor of cvd reactor to drive shaft
A recently granted patent (Publication Number: US11959190B2) discloses a device designed for attaching a susceptor of a chemical vapor deposition (CVD) reactor to a drive shaft. The device includes a support plate with a bearing surface, a flange element, a base plate connected to the drive shaft via the flange element, and adjustment means for altering the inclination of the support plate's bearing surface concerning the base plate. The adjustment means consist of adjustment levers positioned between the base plate and the support plate, allowing for precise adjustments to be made.
Moreover, the device features traction elements to apply force towards the base plate, a position-adjusting element in the form of an orientation pin on the support plate, and releasable means of attachment for securing the base plate to the flange element. The patent also details the inclusion of gas channels within the support plate, connecting gas inlet openings on the lower face of the support plate to gas outlet openings on the bearing surface. Additionally, a seal made of flexible material is inset in a cavity on the support plate's extension, resting on the drive shaft's end face, with gas passage openings aligned with the gas inlet openings.
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