Nova has been granted a patent for an X-ray metrology system that includes an improved patterned X-ray emitting target. The system comprises an electron gun, X-ray blocking mask, structural elements, monochromator, sample holder, and detector for analyzing scattered X-ray beams. GlobalData’s report on Nova gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Nova, Pose estimation was a key innovation area identified from patents. Nova's grant share as of May 2024 was 33%. Grant share is based on the ratio of number of grants to total number of patents.
Patterned x-ray emitting targets for x-ray metrology systems
A recently granted patent (Publication Number: US11996259B2) discloses an X-ray metrology system that includes an X-ray source with an electron gun generating an electron beam and a patterned X-ray emitting target with an X-ray blocking mask and structural elements to reflect the X-ray beam. The system also features a sample holder, monochromator, and detector for analyzing scattered X-rays from a sample with a periodic structure. The patent claims various configurations for the system, including compensating for focal aberrations, generating desired X-ray patterns, and utilizing materials with different X-ray absorption characteristics.
Furthermore, the patent details additional features such as the use of a fixed electron gun with a moving X-ray emitting target, spatially varying intensity of the electron beam, and enhanced heat conduction characteristics in the X-ray generating substrate. The system also incorporates boron doping, patterned heat conductive layers, and displacement capabilities for the X-ray generating substrate. Additionally, the patent mentions the use of X-ray emitting overlays on thermal conductivity substrates made from materials like beryllium oxide, tungsten, and silicon carbide. These innovative elements aim to improve the efficiency and accuracy of X-ray metrology systems for various applications in research, manufacturing, and quality control processes.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
