Hamamatsu Photonics has been granted a patent for an ultraviolet light generation target containing a YPO4 crystal with scandium added, emitting UV light when exposed to an electron beam. The method involves preparing a mixture of Y oxide, Sc oxide, and phosphoric acid, evaporating the liquid, and firing the mixture. GlobalData’s report on Hamamatsu Photonics gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Hamamatsu Photonics, Welding robots was a key innovation area identified from patents. Hamamatsu Photonics's grant share as of January 2024 was 40%. Grant share is based on the ratio of number of grants to total number of patents.
Ultraviolet light generation target containing ypo4 crystal with scandium
A recently granted patent (Publication Number: US11887837B2) discloses an ultraviolet light generation target designed to emit ultraviolet light when subjected to an electron beam. The target includes a light emitting portion containing a YPO4 crystal with the addition of scandium (Sc), and optionally bismuth (Bi). The molar composition ratio of Sc in the crystal is specified to be between 0.02 and 0.6, and the diffraction intensity peak waveform of the crystal is limited to a half width of 0.25° or less when measured using an X-ray diffractometer.
Furthermore, the patent also covers a method for manufacturing the ultraviolet light generation target, involving the preparation of a mixture containing yttrium (Y) oxide, scandium (Sc) oxide, phosphoric acid or a phosphoric acid compound, and a liquid, followed by evaporation and firing of the mixture. The method allows for the addition of bismuth (Bi) oxide in the mixture and specifies a mixing ratio of Sc oxide within a certain range. Additionally, the firing temperature is set at 1050°C or higher. The patent also includes an electron beam excited ultraviolet light source comprising the ultraviolet light generation target and an electron source for irradiating the light emitting portion with the electron beam.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
