Ichor has been granted a patent for a system designed for processing articles in semiconductor fabrication. The system includes multiple fluid supplies, apparatuses for controlling flow, mounting substrates, vacuum and outlet manifolds, a vacuum source, and a processing chamber. The apparatuses control flow and are connected to the mounting substrates, vacuum manifold, and outlet manifold. GlobalData’s report on Ichor gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Ichor, was a key innovation area identified from patents. Ichor's grant share as of February 2024 was 52%. Grant share is based on the ratio of number of grants to total number of patents.
Semiconductor fabrication system with fluid supplies and control apparatuses
A recently granted patent (Publication Number: US11899477B2) discloses a system for processing articles that includes a first fluid supply, a second fluid supply, and apparatus for controlling flow attached to mounting substrates. These substrates are connected to a vacuum manifold and an outlet manifold, with a processing chamber fluidly coupled to the outlet manifold. The vacuum manifold and outlet manifold consist of primary channels and feed channels, with specific orientations and intersections to optimize the flow of process fluids within the system. The mounting substrates are designed with cradles and port blocks to facilitate the fluid connections effectively.
Furthermore, the patent also describes a system for controlling process fluids, similar to the previous system but with additional details on the configuration of the vacuum manifold, outlet manifold, and mounting substrates. The primary channels of the manifolds extend along longitudinal axes, with feed channels perpendicular to optimize fluid flow. The mounting substrates feature cradles and port blocks for efficient fluid coupling. The design of the system aims to enhance the processing of articles by ensuring precise control and distribution of process fluids throughout the system, ultimately improving overall performance and reliability in article processing applications.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
