KLA had 21 patents in future of work during Q2 2024. KLA Corp’s patents in Q2 2024 focus on a characterization system using machine learning, defect mitigation methods, and evaluating semiconductor metrology tool productivity. The characterization system trains a machine learning-based library, generates measurements, and monitors measurement uncertainty. The defect mitigation method identifies disqualifying defects and generates tool readable indexes for downstream fabrication adjustments. The evaluation system combines individual and fleet productivity metrics to quickly identify problematic tools and predict future failure events. GlobalData’s report on KLA gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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KLA had no grants in future of work as a theme in Q2 2024.
Recent Patents
Application: System and method for estimating measurement uncertainty for characterization systems (Patent ID: US20240201637A1)
The patent filed by KLA Corp. describes a characterization system that includes controllers with processors executing program instructions to train a machine learning-based characterization library, generate characterization measurements, determine additional measurements using non-machine learning techniques, and compare the results to monitor measurement uncertainty. The system aims to improve accuracy by adjusting the machine learning library based on comparisons and includes specific applications like overlay and angular tilt metrology.
The system also involves a method for training the machine learning library, generating measurements, determining additional measurements using non-machine learning techniques, and comparing results to monitor uncertainty. The method includes adjusting the library based on comparisons and specific techniques like calculating asymmetry signals and determining overlay functions. Overall, the system and method focus on enhancing measurement accuracy and reliability through a combination of machine learning and traditional techniques, particularly in overlay and angular tilt metrology applications.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
