Entegris. has been granted a patent for a composition and method designed to selectively etch titanium nitride and photoresist residues while preserving low-k dielectric layers in microelectronic devices. The composition includes a solvent mixture, an oxidizing agent, a chelating agent, and a corrosion inhibitor. GlobalData’s report on Entegris gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Entegris, 3D memory devices was a key innovation area identified from patents. Entegris's grant share as of July 2024 was 50%. Grant share is based on the ratio of number of grants to total number of patents.
The granted patent US12074034B2 describes a novel composition designed for the removal of titanium nitride and photoresist etch residue from microelectronic devices. The composition includes a solvent mixture that consists of water, a water-miscible organic solvent, N-methylmorpholine-N-oxide (2.5 to 5 wt. %), dimethyl sulfone, an oxidizing agent (approximately 15 wt. %), a chelating agent, a corrosion inhibitor (phosphoric acid), and at least one etchant or pH adjustor. The pH of the composition is maintained between 5 and 12, ensuring compatibility with various microelectronic materials. Specific examples of the water-miscible organic solvents include diethylene glycol monobutyl ether and diethylene glycol monoethyl ether, while hydrogen peroxide is identified as a potential oxidizing agent.
Additionally, the patent outlines various parameters for the composition, such as the inclusion of a surfactant and the specific weight percentages of its components. The composition is noted for its effective etch rates, achieving an aluminum oxide etch rate of 0.4 angstroms per 10 minutes or less, a copper etch rate of 2.1 angstroms per 10 minutes or less, and a titanium nitride etch rate of 191 angstroms per 2 minutes or greater. The patent also describes a method for utilizing this composition in microelectronics and includes a kit containing the necessary components for its application. Overall, this patent presents a comprehensive formulation aimed at enhancing the efficiency of microelectronic device cleaning processes.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
