Soitec has been granted a patent for a process to produce a monocrystalline layer of AlN material. The method involves transferring a monocrystalline SiC-6H seed layer to a silicon carrier substrate and subsequently growing the AlN layer epitaxially, utilizing molecular adhesion techniques at ambient temperature. GlobalData’s report on Soitec gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Soitec, 3D memory devices was a key innovation area identified from patents. Soitec's grant share as of July 2024 was 52%. Grant share is based on the ratio of number of grants to total number of patents.
Process for producing monocrystalline aln layer on silicon
The patent US12071706B2 outlines a novel process for producing a monocrystalline layer of aluminum nitride (AlN) material. The method involves transferring a monocrystalline seed layer of silicon carbide (SiC-6H) to a silicon carrier substrate, which consists of two silicon wafers bonded together with a detachable interface. This transfer is achieved through molecular adhesion at ambient temperature, followed by annealing to strengthen the bonding interface. The claims specify that the SiC-6H seed layer can be less than 10 µm thick, with further options for thinning the substrate post-joining, including the formation of a weakened zone for easier transfer.
Additionally, the patent describes various techniques for detaching the interface, such as laser debonding, chemical attack, or mechanical stress. The seed layer may also be structured as multiple tiles, enhancing flexibility in the manufacturing process. The detachable interface is characterized by a roughened surface or a porous silicon layer, facilitating the separation of the layers when required. Overall, the claims provide a comprehensive framework for the production of high-quality AlN layers, which are essential for various semiconductor applications.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
