Aixtron has been granted a patent for a device that attaches a susceptor in a CVD reactor to a drive shaft, allowing rotation. The device includes a base plate, support plate, adjusting levers, and a flange element for adjusting the inclination of the support plate. GlobalData’s report on Aixtron gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Aixtron, 3D memory devices was a key innovation area identified from patents. Aixtron's grant share as of April 2024 was 42%. Grant share is based on the ratio of number of grants to total number of patents.
Device for attaching susceptor of cvd reactor to drive shaft
A recently granted patent (Publication Number: US11959190B2) discloses a device designed for attaching a susceptor of a chemical vapor deposition (CVD) reactor to a drive shaft. The device comprises a support plate with a bearing surface, a flange element, a base plate connected to the drive shaft via the flange element, and adjustment means for adjusting the inclination of the bearing surface relative to a seating face of the base plate. The adjustment means include adjustment levers located between the base plate and the support plate, allowing for precise adjustments to be made.
Additionally, the device features traction elements to apply force through the support plate towards the base plate, a position-adjusting element in the form of an orientation pin, and releasable means of attachment for securing the base plate to the flange element. The patent also details the configuration of the CVD reactor, where the drive shaft rotates the susceptor, and the supporting face of the susceptor corresponds to the diameter of the support plate. The device's design includes clamping devices on the flange element for attachment to the drive shaft, attachment screws for securing the base plate, and an annular web surrounding the bearing surface of the support plate. Furthermore, gas channels within the support plate facilitate gas flow within the CVD reactor, and a seal with gas passage openings ensures a secure connection with the drive shaft, enhancing the device's functionality and efficiency in CVD processes.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
