Applied Materials has developed a plasma resistant coating using atomic layer deposition (ALD) process, comprising rare earth metal-containing oxide and a second oxide stack. The coating can uniformly cover surfaces with varying aspect ratios. The patent aims to protect articles from plasma damage efficiently. GlobalData’s report on Applied Materials gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Applied Materials, 3D memory devices was a key innovation area identified from patents. Applied Materials's grant share as of May 2024 was 41%. Grant share is based on the ratio of number of grants to total number of patents.
Plasma resistant coating for articles using ald process
A recently granted patent (Publication Number: US12002657B2) discloses an innovative article with a plasma-resistant coating designed to withstand high temperatures and prevent cracking and delamination. The coating consists of a stress relief layer and a stack of alternating layers of rare earth metal-containing oxide and a second oxide. The unique structure of the coating, with specific thickness ratios and compositions, ensures the prevention of crystalline structure in the rare earth metal-containing oxide, making it ideal for applications in semiconductor processing chambers.
The article, which can be used as a chamber component in semiconductor processing chambers, features a plasma-resistant coating that uniformly covers the surface and exhibits resistance to cracking and delamination at temperatures up to 350°C. The composition of the coating, including specific mol percentages of Y2O3 and ZrO2, as well as the presence of a stress relief layer comprising amorphous Al2O3, contributes to its exceptional performance. With a focus on maintaining a porosity-free surface, the plasma-resistant coating is designed to enhance the durability and efficiency of chamber components, such as chamber walls, shower heads, plasma generation units, diffusers, nozzles, and gas lines, in semiconductor processing environments.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
