Diodes has filed a patent for a method of manufacturing a semiconductor device involving depositing epitaxial layers on a semiconductor substrate to create P-N junctions. The process includes varying doping concentrations to achieve desired conductivity types. This innovation aims to enhance semiconductor device performance. GlobalData’s report on Diodes gives a 360-degree view of the company including its patenting strategy. Buy the report here.

According to GlobalData’s company profile on Diodes, Authentication communication protocols was a key innovation area identified from patents. Diodes's grant share as of January 2024 was 68%. Grant share is based on the ratio of number of grants to total number of patents.

Semiconductor device manufacturing method with epitaxial layer deposition

Source: United States Patent and Trademark Office (USPTO). Credit: Diodes Incorporated

A recently filed patent (Publication Number: US20240021602A1) discloses a method for manufacturing a semiconductor device. The method involves depositing an epitaxial layer on a semiconductor substrate, with the epitaxial layer having a different conductivity type than the substrate. The epitaxial layer is deposited in multiple layers with varying doping concentrations to create P-N junctions within the device. Additionally, the method includes forming doped regions at the surface of the epitaxial layer to further enhance the functionality of the semiconductor device.

Furthermore, the patent claims describe additional steps such as selectively etching the epitaxial layer and substrate to form trenches, filling the trenches with electrically insulating material, and connecting electrodes to different regions of the device. The semiconductor device manufactured using this method is designed for electrostatic discharge (ESD) protection, highlighting its potential application in safeguarding electronic components from ESD damage. The unique design of the device, with multiple doped regions and P-N junctions, sets it apart in terms of efficiency and performance in ESD protection applications.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.