Lam Research had 19 patents in future of work during Q4 2023. The patents filed by Lam Research Corp in Q4 2023 include a reflectometer system for monitoring substrate movements in a process chamber, a system for deformation and stress analysis modeling in a virtual fabrication environment, and a method for generating a radio frequency waveform for electrodes. These inventions aim to improve control and analysis in semiconductor manufacturing processes. GlobalData’s report on Lam Research gives a 360-degreee view of the company including its patenting strategy. Buy the report here.
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Lam Research grant share with future of work as a theme is 57% in Q4 2023. Grant share is based on the ratio of number of grants to total number of patents.
Recent Patents
Application: Reflectometer to monitor substrate movement (Patent ID: US20230420281A1)
The patent filed by Lam Research Corp. describes a reflectometer and reflectometry system designed to monitor movements of a substrate, such as a silicon wafer, within a process chamber. The system includes a light source emitting a beam directed at the substrate, collection optics to receive reflected light and output signals related to substrate conditions, and a processor to analyze the signals and control substrate movement through an actuator mechanism. The system aims to enhance process control by monitoring and adjusting substrate positioning based on the reflected light signals.
The patent's claims detail the specific functionalities of the reflectometry system, including monitoring conditions associated with an electrostatic chuck (ESC) in the process chamber. The system is equipped with a processor to compare output signals with expected values, providing indications of ESC conditions such as loose bolts, changes in microroughness levels, or the need for maintenance. The system can generate alarms or display notifications on a graphical user interface to alert operators of ESC issues, enabling timely intervention and maintenance to ensure optimal performance of the substrate-holding device within the process chamber.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
