Nano Dimension has filed a patent for a method of fabricating passive RC frequency pass filters using additive manufacturing. The method involves using an ink jet printing system to simultaneously deposit conductive and dielectric inks to form the filters. The filters have a predetermined cutoff frequency and a wide stop band frequency. The process includes multiple steps such as forming patterns with the inks, curing and sintering the patterns, and repeating the process for subsequent layers. The resulting filters consist of resistors, capacitors, and transmission load traces. GlobalData’s report on Nano Dimension gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Nano Dimension, Spacecraft 3D Printing was a key innovation area identified from patents. Nano Dimension's grant share as of September 2023 was 27%. Grant share is based on the ratio of number of grants to total number of patents.
The patent filed is for a method of fabricating passive rc frequency pass filters using additive manufacturing
A recently filed patent (Publication Number: US20230269882A1) describes a method for fabricating a passive resistor/capacitor (RC) frequency pass filter (FPF) using an ink jet printing system. The method involves using a first print head to dispense a dielectric ink composition and a second print head to dispense a conductive ink composition. A conveyor system conveys a substrate to each print head, and a computer aided manufacturing (CAM) module controls the printing process. The CAM module receives a 3D visualization file representing the FPF and generates a file library with printing instructions for each layer of the FPF.
The method includes several steps, such as forming patterns with the dielectric ink and curing them in the 2D layer of a multilayer PCB. Patterns with the conductive ink are formed and sintered. The process repeats for subsequent layers until the final layer is printed. The resulting passive RC FPF includes resistors and capacitors in intermediate layers, configured in series and parallel with transmission load traces, respectively. The capacitors are sized to provide a predetermined cut-off frequency, and the transmission load traces are designed to couple with the capacitors and resistors.
The patent also describes different variations of the FPF, such as a first low-pass filter (LPF1) with a frequency cut-off at 2.4 GHz and a second low-pass filter (LPF2) with a frequency cut-off at 5.0 GHz. The rate of frequency rolloff for LPF1 and LPF2 is not less than -25 dB/GHz. The stop band of LPF1 is lower than -25 dB between 3.4 GHz and 20 GHz. The isolation parameter of LPF1 and LPF2 is not more than -25 dB between 3.4 GHz and 20 GHz.
Other aspects of the method include the use of at least four passive capacitors in the FPF, shielding the transmission load traces in the final layer, and coupling the capacitors to ground plane layers using blind or buried vias. The ground plane layers can cover a significant portion of the intermediate layer area, and the capacitors are comprised of two conductive layers separated by a dielectric ink layer. The transmission load traces have specific dimensions and are configured to have an aspect ratio L/W>1. The FPF may also include multiple transmission traces and meshed ground layers aligned with the transmission lines to form resonant layers.
The patent also mentions the file library used in the printing process, which includes files representing conductive ink patterns, dielectric ink patterns, or both. Each file's metadata includes data representing the location of the printed layer relative to adjacent layers.
Overall, this patent describes a method for fabricating a passive RC FPF using an ink jet printing system, providing various design options and specifications for different types of filters.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
