Onto Innovation. has been granted a patent for a method that utilizes an effective cell approximation to analyze standard logic cells. This method involves producing light, measuring its reflection from a sample, and comparing data to determine characteristics of the logic cell based on its density of lines and spaces. GlobalData’s report on Onto Innovation gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Onto Innovation, Defect detection models was a key innovation area identified from patents. Onto Innovation's grant share as of July 2024 was 59%. Grant share is based on the ratio of number of grants to total number of patents.
Effective cell approximation for standard logic cell characterization
The patent US12013350B2 outlines a method and an optical metrology device designed to analyze standard logic cells on a sample. The method involves producing light that is directed at a sample, which is then reflected and detected. The process includes obtaining data for an effective cell approximation that is smaller than the standard logic cell, representing its density of lines and spaces. This effective cell approximation is derived from a selected area of the standard logic cell and can incorporate non-periodic patterns. The method further entails acquiring measured data from the reflected light and determining characteristics of the standard logic cell based on this data and the effective cell approximation.
The optical metrology device described in the patent comprises a light source, a detector, and a processor. The processor is responsible for obtaining data for the effective cell approximation, acquiring measured data from the sample, and determining characteristics of the standard logic cell. The device can utilize various parameters, such as line widths and heights, to refine the effective cell approximation model. Additionally, the device is capable of iteratively adjusting parameters to achieve an acceptable fit between measured and calculated data, thereby enhancing the accuracy of the characterization of the standard logic cell. This innovative approach aims to improve the precision of optical metrology in semiconductor manufacturing and related fields.
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