Synopsys has patented a method to enhance mask data for semiconductor device fabrication. By setting defect threshold values based on failure rates, performing optimal proximity corrections, and adjusting mask pattern contours, the technology aims to minimize defects during manufacturing. GlobalData’s report on Synopsys gives a 360-degree view of the company including its patenting strategy. Buy the report here.

According to GlobalData’s company profile on Synopsys, AI assisted CAD was a key innovation area identified from patents. Synopsys's grant share as of January 2024 was 75%. Grant share is based on the ratio of number of grants to total number of patents.

Improving mask data for semiconductor device fabrication

Source: United States Patent and Trademark Office (USPTO). Credit: Synopsys Inc

A recently granted patent (Publication Number: US11874597B2) discloses a method for enhancing mask data used in the production of semiconductor devices. The method involves setting a threshold value based on the stochastic failure rate of a defect, performing optimal proximity corrections on the mask data, identifying potential defect locations, and conducting a second round of corrections to ensure distances between mask pattern contours exceed the threshold value. The technique aims to improve the quality and reliability of semiconductor fabrication processes by addressing defects such as bridges and pinches through precise adjustments to the mask data.

Furthermore, the patent details the use of rigorous simulation models to determine stochastic failure rates, the application of Gaussian distribution functions to define mask pattern contours, and the generation of masks suitable for extreme ultraviolet lithography systems. By incorporating advanced optimization techniques like inverse lithography and Manhattanization, the method outlined in the patent offers a comprehensive approach to enhancing mask data for semiconductor fabrication. The inclusion of specific parameters such as standard deviations for mask pattern contours and angles for Manhattanized patterns demonstrates a meticulous and systematic methodology to ensure the efficient production of high-quality semiconductor devices.

To know more about GlobalData’s detailed insights on Synopsys, buy the report here.

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GlobalData, the leading provider of industry intelligence, provided the underlying data, research, and analysis used to produce this article.

GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.