Tokyo Electron had four patents in advanced materials during Q2 2024. The patent filed by Tokyo Electron Ltd in Q2 2024 is for a plasma processing apparatus that includes a processing container, an electrode, a high-frequency power supply, and a high-frequency power supply circuit. The circuit has a matching device with a negative impedance portion to match the high-frequency power supply-side impedance with the plasma-side impedance during plasma processing on a substrate. GlobalData’s report on Tokyo Electron gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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Tokyo Electron had no grants in advanced materials as a theme in Q2 2024.
Recent Patents
Application: Plasma processing device, high-frequency power supply circuit, and impedance matching method (Patent ID: US20240120179A1)
The patent filed by Tokyo Electron Ltd. describes a plasma processing apparatus that includes a processing container, an electrode, a high-frequency power supply, and a high-frequency power supply circuit. The high-frequency power supply circuit consists of a power supply path and a matching device with a negative impedance portion to match the high-frequency power supply-side impedance with the plasma-side impedance. The negative impedance portion can be a negative impedance conversion circuit or a metamaterial, and the matching device may include multiple negative impedance portions.
Furthermore, the patent includes claims related to the configuration and components of the plasma processing apparatus, such as the negative impedance conversion circuit with an operational amplifier, a booster circuit for igniting plasma, and an impedance adjustment part with a variable reactance circuit. The high-frequency power supply circuit also involves a booster to amplify the output of the negative impedance portion. Additionally, the patent outlines an impedance matching method for generating plasma by supplying high-frequency power, which involves matching the high-frequency power supply-side impedance with the plasma-side impedance using a negative impedance portion in the matching device. The negative impedance portion can be a negative impedance conversion circuit or a metamaterial.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
