KLA has patented a protective amorphous layer for hygroscopic nonlinear optical crystals, composed of alkali metal borates. This layer enhances durability by preventing moisture and oxygen infiltration, facilitating the use of these crystals in semiconductor inspection and lithography systems. Additional coatings can further optimize optical performance. GlobalData’s report on KLA gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on KLA, Defect detection models was a key innovation area identified from patents. KLA's grant share as of July 2024 was 57%. Grant share is based on the ratio of number of grants to total number of patents.
Protective coating for nonlinear optical crystals
The patent US12072606B2 describes a sophisticated optical system designed for generating and directing ultraviolet light, specifically within the wavelength range of 100 nm to 300 nm. Central to this system is a light source that incorporates a nonlinear optical crystal, which is capable of converting longer wavelengths (over 300 nm) into the desired ultraviolet output. The crystal features a substrate made from a hygroscopic nonlinear optical material, such as cesium lithium borate (CLBO) or cesium triborate (CBO), and is enveloped by a first amorphous material layer composed primarily of alkali metal borates. This layer not only encapsulates the substrate but also minimizes reflectivity at specific wavelengths, enhancing the efficiency of light transmission through the system.
Additionally, the patent outlines various configurations for the optical system, including the potential integration of multiple optical material layers that further optimize light passage. The system is applicable in fields such as semiconductor inspection, metrology, and lithography, where precise exposure patterns on samples are critical. The claims also detail methods for forming the amorphous layer on the nonlinear optical crystal, including specific temperature controls and the use of inert environments to achieve desired thicknesses that reduce reflectivity. Overall, this patent presents a novel approach to ultraviolet light generation and manipulation, with implications for advanced optical applications.
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