Tokyo Electron has been granted a patent for a control method in an inspection apparatus. The method involves individually lighting multiple light sources to measure temperature distributions on a substrate, calculating a combined temperature distribution, and adjusting light output based on correction values derived from these measurements. GlobalData’s report on Tokyo Electron gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Tokyo Electron, 3D memory devices was a key innovation area identified from patents. Tokyo Electron's grant share as of July 2024 was 58%. Grant share is based on the ratio of number of grants to total number of patents.
Control method for substrate heating in inspection apparatus
The patent US12075537B2 outlines a control method for an inspection apparatus designed to evaluate substrates with specific inspection objects. The method involves a systematic approach where multiple light sources are individually activated to generate first temperature distributions of the substrate. These distributions are then aggregated to form a second temperature distribution. Based on this second distribution, correction values are derived to adjust the light output from the light sources, ensuring optimal heating of the substrate. The process includes capturing thermal images of the substrate to facilitate the calculation of these temperature distributions.
Additionally, the claims specify that the light sources are strategically arranged in designated areas, including those directly over the inspection object and surrounding regions. The method emphasizes that correction values for light sources in the surrounding areas may differ from those directly over the inspection object, with the former typically requiring greater adjustments. The apparatus is equipped with a controller that manages the light sources and incorporates correctors to refine the control commands based on the derived correction values. This structured approach aims to enhance the accuracy and efficiency of the inspection process by ensuring that the substrate is uniformly heated, thereby improving the reliability of the inspection results.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
