Lam Research’s patented substrate processing system features a dual ion filter to enhance plasma uniformity. The system includes upper and lower chambers, a gas delivery system, and an RF generator. The dual ion filter consists of two sets of through holes to filter ions and control plasma uniformity effectively. GlobalData’s report on Lam Research gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Lam Research, 3D memory devices was a key innovation area identified from patents. Lam Research's grant share as of April 2024 was 55%. Grant share is based on the ratio of number of grants to total number of patents.
Substrate processing system with dual ion filter
A recently granted patent (Publication Number: US11967486B2) discloses a substrate processing system designed to enhance plasma processing efficiency. The system comprises an upper chamber, a gas delivery system, an RF generator for plasma generation, a lower chamber with a substrate support, and a dual ion filter placed between the upper and lower chambers. The dual ion filter consists of an upper filter with smaller through holes for ion filtration and a lower filter with larger through holes to control plasma uniformity. The number and diameter of the holes in each filter are carefully configured to optimize performance.
Additionally, the patent details various configurations and features of the substrate processing system, including the connection of the filters to different reference potentials, specific diameter ranges for the through holes, the inclusion of cooling plenums, spacing rings, fasteners, protective covers, and inductive coils for plasma generation. The filters can also be coated with yttria for improved performance and have varying thicknesses to suit different requirements. Overall, the system aims to provide efficient and controlled plasma processing for substrates, with the filters playing a crucial role in ion filtration and plasma uniformity. The patent highlights the importance of these components in enhancing the overall performance and reliability of substrate processing systems in various industrial applications.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
