Lam Research‘s patented plasma processing device includes a dielectric window, vacuum chamber, energy source, and air amplifier to enclose and transform plasma processing gas. The device utilizes electromagnetic energy to create an elevated temperature region and features air amplifiers for cooling. GlobalData’s report on Lam Research gives a 360-degree view of the company including its patenting strategy. Buy the report here.

According to GlobalData’s company profile on Lam Research, 3D memory devices was a key innovation area identified from patents. Lam Research's grant share as of January 2024 was 52%. Grant share is based on the ratio of number of grants to total number of patents.

Plasma processing device with dielectric window and air amplifier

Source: United States Patent and Trademark Office (USPTO). Credit: Lam Research Corp

A recently granted patent (Publication Number: US11887819B2) discloses a plasma processing device that includes a dielectric window with plasma and air exposed surfaces, a vacuum chamber, and an energy source that transmits electromagnetic energy to create a plasma. The device also features at least one air amplifier in communication with the air exposed surface of the dielectric window and a plenum divided into multiple segments to receive cooling air from the air amplifier. The plenum is designed to enclose a pressure region and can combine with another plenum to form different shapes like a cylinder or a ring.

Furthermore, the patent describes the configuration of the air amplifier, which includes a first inlet for pressurized air, a second inlet for ambient air, and an exhaust for amplified air output. The plenum, divided into wedge-shaped segments, is pressurized to a back pressure of at least 1 in-H2O and is positioned over the elevated temperature region of the dielectric window. This innovative plasma processing device aims to improve efficiency and control in plasma processing applications by optimizing cooling air flow and pressure within the system.

To know more about GlobalData’s detailed insights on Lam Research, buy the report here.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.